System method and apparatus for dry-in, dry-out, low defect laser dicing using proximity technology

ABSTRACT

A substrate processing system includes a first, movable surface tension gradient device, a dicing device and a system controller. The first, movable surface tension gradient device is capable of supporting a first process within a first meniscus. The first meniscus being supported between the first surface tension gradient device and a first surface of the substrate. The first movable surface tension gradient device capable of being moved relative to the first surface of the substrate. The dicing device is oriented to a desired dicing location. The desired dicing location being encompassed by the meniscus. The system controller is coupled to the dicing device and the surface tension gradient device. The system controller includes a process recipe. A method for dicing a substrate is also described.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a continuation-in-part of and claims priority fromU.S. patent application Ser. No. 10/606,022 filed on Jun. 24, 2003 andentitled “System and Method for Integrating In-Situ Metrology Within aWafer Process,” by Boyd et al., which is incorporated herein byreference in its entirety for all purposes.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates generally to dicing substrates, and moreparticularly, to methods and systems for simultaneously cleaning anddicing substrates.

2. Description of the Related Art

Integrated circuits are formed through many processes appliedsequentially to a semiconductor wafer or substrate. Typically multipleintegrated circuits are formed on a single substrate. Each of theintegrated circuits is confined to an area referred to as a die or anintegrated circuit die. Typically a small region of unused space remainsbetween the integrated circuit dies within which no devices required bythe integrated circuits are formed. This unused space is typicallyreferred to as the scribe channel. The dies are separated by cutting thesubstrate through the scribe channel after the multiple integratedcircuit dies are formed. Separating the dies is referred to as dicing ordie singulation.

The substrate can be diced using several different approaches. Onapproach is with an abrasive circular saw that grinds through thesubstrate along the scribe channel. Another approach is by scoring thesubstrate with a sharp or abrasive tool along the scribe channels andthen breaking the substrate along the score lines drawn. Yet anotherapproach is to cut or score the substrate with a laser. The dicingprocess can be a partial dicing, where the substrate is not cut all theway through. Alternatively, dicing can be full dicing, where thesubstrate is cut all the way through.

One laser technology used for dicing the substrate can be referred to asa water-jet-guided laser such as may be available from Synova SA ofEcublens, Switzerland. Synova's water-jet guided laser directs a stream(i.e., jet) of water along the scribe channel on the surface of thesubstrate and focuses a laser at the point where the water jet meets thesurface of the substrate. The water jet can also encompass the laserlight. As the laser light cuts (either fully or partially) into thesubstrate, the water jet carries away any dicing by-products (i.e.,swarf) such as particles. Further, the water from the water jet tends tospread out over the surrounding surface of the substrate and therebysomewhat limit or at least reduce the adhesion of the particles to thesurrounding surface of the substrate.

Unfortunately, the water-jet-guided laser is a wet process and theresulting dies must then be thoroughly cleaned of any particlecontamination. Both front side (the side of the die with the integratedcircuit formed thereon) and the back side (the side opposite the frontside) of each and every die must be cleaned. After the front and backsides of each of the dies are cleaned, both the front and back sides ofthe dies must also be dried. This cleaning and drying process requiresadditional processing and handling of the dies after the dicing. Duringthis additional processing and handling the dies can be damaged and/orprocess problems can occur. In view of the foregoing, there is a needfor a system and method of dicing integrated circuits without the needof a subsequent cleaning and drying process.

SUMMARY OF THE INVENTION

Broadly speaking, the present invention fills these needs by providing asystem and method for dicing substrates without the need of a subsequentcleaning and drying process. It should be appreciated that the presentinvention can be implemented in numerous ways, including as a process,an apparatus, a system, computer readable media, or a device. Severalinventive embodiments of the present invention are described below.

One embodiment provides a substrate processing system that includes afirst, movable surface tension gradient device, a dicing device and asystem controller. The first, movable surface tension gradient device iscapable of supporting a first process within a first meniscus. The firstmeniscus being supported between the first surface tension gradientdevice and a first surface of the substrate. The first movable surfacetension gradient device capable of being moved relative to the firstsurface of the substrate. The dicing device is oriented to a desireddicing location. The desired dicing location being encompassed by themeniscus. The system controller is coupled to the dicing device and thesurface tension gradient device.

The process includes at least one of a group of processes consisting ofa cleaning process, a rinsing process, an etch process, a depositionprocess, and an electroplating process. Supporting the process caninclude flowing a process fluid through the meniscus.

Supporting the process can also include moving the meniscus relative tothe first surface of the substrate. Moving the meniscus relative to thefirst surface of the substrate can include drying the first surface. Thedicing device can include a laser. The laser can include a water-jetlaser.

The surface tension gradient device includes a proximity head. Themeniscus can include a dry region substantially surrounding the desireddicing location. The dicing device can be moved with the surface tensiongradient device.

The dicing device can be moved independent from the surface tensiongradient device. The system can also include a sensor capable ofmonitoring the desired dicing location.

The system can also include a dicing target supported on a secondsurface of the substrate. The second surface being opposite the firstsurface. The dicing target being supported in a position correspondingto the desired dicing location. The dicing device can be a laser and thedicing target can be a laser absorbing target.

The system can also include a second, movable surface tension gradientdevice capable of supporting a second process within a second meniscus.The second meniscus being supported between the second surface tensiongradient device and a second surface of the substrate. The secondsurface being opposite the first surface. The second movable surfacetension gradient device capable of being moved relative to the secondsurface of the substrate.

Another embodiment provides a method of dicing a substrate. The methodincludes placing a substrate in a substrate dicing system and forming ameniscus between a proximity head and a first surface of the substrate.The substrate can be diced at a desired dicing location and anyparticles and contaminants generated by dicing the substrate can besimultaneously captured within the meniscus. The meniscus including thedesired dicing location. The meniscus can be moved in a desired dicingdirection.

Moving the moving the meniscus in the desired dicing direction caninclude drying the first surface of the substrate. Dicing the substratecan include a partial dicing. Dicing the substrate can include applyinga laser to the desired dicing location. Applying the laser can includeapplying the laser through the meniscus.

The meniscus can be an annular meniscus and includes a dry centralregion and wherein applying the laser can include applying the laserthrough dry central region of the meniscus.

Dicing the substrate includes a full dicing. The method can also includeforming a second meniscus between a second surface of the substrate. Thesecond surface being opposite from the first surface of the substrate.Dicing the substrate at the desired dicing location can includesimultaneously capturing any particles and contaminants generated bydicing the substrate within the second meniscus.

Moving the first meniscus in the desired dicing direction can includemoving the second meniscus. Dicing the substrate can include applying alaser to the desired dicing location and absorbing the laser in a laserabsorbing target near the second surface of the substrate.

Yet another embodiment provides a substrate processing system. Thesubstrate processing system includes a first proximity head, a dicinglaser source, a second proximity head, a laser absorbing target, and asystem controller. The first proximity head being capable of supportinga first process within a first meniscus. The first meniscus beingsupported between the first proximity head and a first surface of thesubstrate. The first proximity head capable of being moved relative tothe first surface of the substrate. The dicing laser source is orientedto direct a laser to a desired dicing location. The desired dicinglocation being encompassed by the first meniscus. The second proximityhead is capable of supporting a second process within a second meniscus.The second meniscus being supported between the second proximity headand a second surface of the substrate. The second surface being oppositethe first surface. The second proximity head capable of being movedrelative to the second surface of the substrate. The laser absorbingtarget capable of being supported in a position corresponding to thedesired dicing location. The system controller being coupled to thedicing laser source and the first and second proximity heads. The systemcontroller including a process recipe.

Other aspects and advantages of the invention will become apparent fromthe following detailed description, taken in conjunction with theaccompanying drawings, illustrating by way of example the principles ofthe invention.

BRIEF DESCRIPTION OF THE DRAWINGS

The present invention will be readily understood by the followingdetailed description in conjunction with the accompanying drawings.

FIG. 1 shows a wafer processing system, in accordance with oneembodiment of the present invention.

FIG. 2 is a side close-up side view of the wafer processing system, inaccordance with one embodiment of the present invention.

FIG. 3 shows a top view of a semiconductor wafer processing system witha proximity head in a horizontal configuration that extends across adiameter of the substrate, in accordance with one embodiment of thepresent invention

FIG. 4 is an embodiment of an exemplary process that may be conducted bya proximity head, in accordance with one embodiment of the presentinvention.

FIG. 5 shows another process using another source inlet/outletorientation that may be conducted by a proximity head, in accordancewith one embodiment of the present invention.

FIG. 6A illustrates a proximity head performing an exemplary process, inaccordance with one embodiment of the present invention.

FIG. 6B shows a top view of a portion of a proximity head, in accordancewith one embodiment of the present invention.

FIG. 7 illustrates a side view of the proximity heads for use in a dualsubstrate surface processing system, in accordance with one embodimentof the present invention.

FIG. 8A illustrates an exemplary proximity head, in accordance with oneembodiment of the present invention.

FIG. 8B illustrates a sectional view of the proximity head, inaccordance with one embodiment of the present invention.

FIG. 9A shows a top view of an exemplary annular meniscus formed by theproximity head, in accordance with one embodiment of the presentinvention.

FIG. 9B shows a sectional view of the annular meniscus formed by theproximity head, in accordance with one embodiment of the presentinvention.

FIG. 10A shows a side view of a substrate dicing system, in accordancewith one embodiment of the present invention.

FIG. 10B shows a top view of the substrate dicing system, in accordancewith one embodiment of the present invention.

FIG. 11 is a flowchart of the method operations for dicing a substrate,in accordance with one embodiment of he present invention.

FIG. 12 shows a full dicing system, in accordance with one embodiment ofthe present invention.

FIG. 13 is a flowchart of the method operations for the operation of thefull dicing system, in accordance with one embodiment of the presentinvention.

FIG. 14 shows a block diagram of a substrate processing system, inaccordance with one embodiment of the present invention.

DETAILED DESCRIPTION OF THE EXEMPLARY EMBODIMENTS

Several exemplary embodiments for a system and method for dicingsubstrates without the need of a subsequent cleaning and drying processwill now be described. It will be apparent to those skilled in the artthat the present invention may be practiced without some or all of thespecific details set forth herein.

The present invention provides a system that combines a proximity headsupporting a dynamic liquid meniscus with a dicing laser. In this systemsubstantially all of the particles generated by the laser areimmediately removed from the surface of the substrate by the dynamicflow of the fluid in the meniscus. Further, the dynamic liquid meniscusperforms a cleaning and/or rinsing process and a drying processsimultaneously with the laser dicing process thereby providing a dry-indry-out substrate dicing process. Further still, the fluid (i.e., DIW)used to form the dynamic liquid meniscus can be recaptured, filtered toremove particles or other contaminants and reused, thereby reducing apotentially costly waste water stream. As the dicing laser can operatethrough a fluid, the dicing laser can be applied either through ameniscus or through an opening in an annular meniscus.

The system described herein improves the dicing process by reducingdefects (e.g., particle contamination, handling errors, etc.), reducingprocess steps, reducing cycle time and reducing a waste water stream.

Part 1: Dynamic Liquid Meniscus

FIG. 1 shows a wafer processing system 100, in accordance with oneembodiment of the present invention. The system 100 includes rollers 102a, 102 b, and 102 c which may hold and rotate a wafer to enable wafersurfaces to be processed. The system 100 also includes proximity heads106 a and 106 b that, in one embodiment, are attached to an upper arm104 a and to a lower arm 104 b respectively. The upper arm 104 a and thelower arm 104 b are part of a proximity head carrier assembly 104 whichenables substantially linear movement of the proximity heads 106 a and106 b along a radius of the wafer.

In one embodiment the proximity head carrier assembly 104 is configuredto hold the proximity head 106 a above the wafer and the proximity head106 b below the wafer in close proximity to the wafer. This may beaccomplished by having the upper arm 104 a and the lower arm 104 b bemovable in a vertical manner so once the proximity heads are movedhorizontally into a location to start wafer processing, the proximityheads 106 a and 106 b can be moved vertically to a position in closeproximity to the wafer. The upper arm 104 a and the lower arm 104 b maybe configured in any suitable way so the proximity heads 106 a and 106 bcan be moved to enable wafer processing as described herein.

It should be appreciated that the system 100 may be configured in anysuitable manner as long as the proximity head(s) may be moved in closeproximity to the wafer to generate and control a dynamic liquid meniscusas discussed below in reference to FIGS. 4 through 6B. It should also beunderstood that close proximity may be any suitable distance from thewafer as long as a dynamic liquid meniscus as discussed in furtherreference to FIGS. 4 through 6B may be maintained. In one embodiment,the proximity heads 106 a and 106 b (as well as any other proximity headdescribed herein) may each be moved to between about 0.1 mm to about 10mm from the wafer to initiate wafer processing operations. In apreferable embodiment, the proximity heads 106 a and 106 b (as well asany other proximity head described herein) may each be moved to betweenabout 0.5 mm to about 4.5 mm from the wafer to initiate wafer processingoperations, and in more preferable embodiment, the proximity heads 106 aand 106 b (as well as any other proximity head described herein) may bemoved to about 2 mm from the wafer to initiate wafer processingoperations.

The system 100, in one embodiment, has the proximity head carrierassembly 104 that is configured to enable the proximity heads 106 a and106 b to be moved from the center of the wafer towards the edge of thewafer. It should be appreciated that the proximity head carrier assembly104 may be movable in any suitable manner that would enable movement ofthe proximity heads 106 a and 106 b to process (e.g., etch, clean,rinse, dry etc.) the wafer, as desired. In one embodiment, the proximityhead carrier assembly 104 can be motorized to move the proximity head106 a and 106 b from the center of the wafer to the edge of the wafer.It should be understood that although the wafer processing system 100 isshown with two proximity heads 106 a and 106 b, that any suitable numberof proximity heads may be utilized such as, for example, 1, 2, 3, 4, 5,6, etc. The proximity heads 106 a and/or 106 b of the wafer processingsystem 100 may also be any suitable size or shape as shown by, forexample, any of the proximity heads as described herein. The proximityheads 106 a and 106 b can also be configured to move independently ofone another such that each of the proximity heads can be over differentportions of the surface of the wafer 108.

The different configurations described herein generate a dynamic liquidmeniscus between the proximity head and the wafer. By way of example,the dynamic liquid meniscus may be moved across the wafer to clean anddry the wafer by applying fluid to the wafer surface and removing thefluids from the wafer surface. Therefore, the proximity heads 106 a and106 b can have any numerous types of configurations as shown herein orother configurations that enable the processes described herein. Itshould also be appreciated that the system 100 may process one surfaceof the wafer or both the top surface and the bottom surface of thewafer. It should also be appreciated that the fluid used to form andsupport the dynamic liquid meniscus can be added and withdrawn throughthe dynamic liquid meniscus so as to constitute a flow through thedynamic liquid meniscus. The fluid flowing through the meniscus can beany suitable type of fluid desired to perform the desired process (e.g.,etch, clean, rinse, electroplate, etc.) The dynamic liquid meniscus alsodries the surface of the substrate as the dynamic liquid meniscus isdrawn away from the surface.

In addition, besides processing both the top and bottom surfaces and ofthe wafer, the system 100 may also be configured to perform differentprocesses on each side of the wafer if desired by inputting andoutputting different types of fluids to each of the respective sides ofthe wafer. By way of example the system 100 can clean the front side ofthe wafer and dry the back side of the wafer. It should be appreciatedthat the system 100 may utilize the application of different chemicalstop and bottom in the proximity heads 106 a and 106 b respectivelydepending on the operation desired. The proximity heads can beconfigured to process the bevel edge of the wafer in addition toprocessing the top and/or bottom of the wafer. This can be accomplishedby moving the meniscus off the edge the wafer that cleans the beveledge. It should also be understood that the proximity heads 106 a and106 b may be the same type of apparatus or different types of proximityheads.

FIG. 2 is a side close-up side view of the wafer processing system 100,in accordance with one embodiment of the present invention. The waferprocessing system 100 is shown holding a wafer 108. The wafer 108 may beheld and rotated by the rollers 102 a, 102 b, and 102 c in any suitableorientation as long as the orientation enables a desired proximity headto be in close proximity to a portion of the wafer 108 that is to beprocessed. In one embodiment, the roller 102 b may be rotated by using aspindle 111, and the roller 102 c may be held and rotated by a rollerarm 109. The roller 102 a may also be rotated by its own spindle. In oneembodiment, the rollers 102 a, 102 b, and 102 c can rotate in aclockwise direction to rotate the wafer 108 in a counterclockwisedirection. It should be understood that the rollers may be rotated ineither a clockwise or a counterclockwise direction depending on thewafer rotation desired. In one embodiment, the rotation imparted on thewafer 108 by the rollers 102 a, 102 b, and 102 c serves to move a waferarea that has not been processed into close proximity to the proximityheads 106 a and 106 b. In an exemplary drying operation, the wet areasof the wafer would be presented to the proximity heads 106 a and 106 bthrough both the linear motion of the proximity heads 106 a and 106 band through the rotation of the wafer 108. The drying or cleaningoperation itself is conducted by at least one of the proximity heads.Consequently, in one embodiment, a dry area of the wafer 108 wouldexpand from a center region to the edge region of the wafer 108 in aspiral movement as a drying operation progresses. In a preferableembodiment, the dry area of the wafer 108 would move around the wafer108 and the wafer 108 would be dry in one rotation (if the length of theproximity heads 106 a and 106 b are at least a radius of the wafer 108).By changing the configuration of the system 100 and the orientation ofand movement of the proximity head 106 a and/or the proximity head 106b, the drying movement may be changed to accommodate nearly any suitabletype of drying or cleaning or other process path.

It should be understood that the proximity heads 106 a and 106 b may beconfigured to have at least one of first source inlet configured toinput deionized water (DIW) or other process chemistry (also known as aDIW inlet), at least one of a second source inlet configured to inputisopropyl alcohol (IPA) in vapor form (also known as IPA inlet), and atleast one source outlet configured to output fluids from a regionbetween the wafer and a particular proximity head by applying vacuum(also known as vacuum outlet). It should be appreciated that the vacuumutilized herein may also be suction. In addition, other types ofsolutions may be inputted into the first source inlet and the secondsource inlet such as, for example, etching chemistries, photoresist wetstripping chemistries, cleaning solutions, ammonia, HF, etc. It shouldbe appreciated that although IPA vapor is used in some of the exemplaryembodiments, other tensio-active substance (substances that provide orincrease or decrease a surface tension gradient between asubstrate-liquid interface) and nitrogen or other inert carrier gas maybe used to carry the tension-active vapor. Alternatives for IPA includebut are not limited to the following: diacetone, diaceton alcohol,1-methoxy-2-propanol, ethylglycol, methyl-pyrrolidon, ethyllactate,2-butanol. In addition, any other type of vapor or gas may be utilizedsuch as for example, nitrogen, argon or other gases, any suitablealcohol vapor, organic compounds, etc. that may be miscible with water.

In one embodiment, the at least one IPA vapor inlet is adjacent to theat least one vacuum outlet which is in turn adjacent to the at least oneDIW inlet to form an IPA-vacuum-DIW orientation. It should beappreciated that other types of orientations such as IPA-DIW-vacuum,DIW-vacuum-IPA, vacuum-IPA-DIW, etc. may be utilized depending on thewafer process that is sought to be enhanced. In a preferable embodiment,the IPA-vacuum-DIW orientation may be utilized to intelligentlygenerate, control, and move the meniscus located between a proximityhead and a wafer to clean and dry wafers. The DIW inlets, the IPA vaporinlets, and the vacuum outlets may be arranged in any suitable manner ifthe above orientation is maintained. For example, in addition to the IPAvapor inlet, the vacuum outlet, and the DIW inlet, in an additionalembodiment, there may be additional sets of IPA vapor outlets, DIWinlets and/or vacuum outlets depending on the configuration of theproximity head desired. Therefore, another embodiment may utilize anIPA-vacuum-DIW-DIW-vacuum-IPA or other exemplary embodiments with an IPAsource inlet, vacuum source outlet, and DIW source inlet configurationsare described herein with a preferable embodiment being described inreference to FIG. 4. It should be appreciated that the exactconfiguration of the IPA-vacuum-DIW orientation may be varied dependingon the application. For example, the distance between the IPA input,vacuum, and DIW input locations may be varied so the distances areconsistent or so the distances are inconsistent. In addition, thedistances between the IPA input, vacuum, and DIW output may differ inmagnitude depending on the size, shape, and configuration of theproximity head 106 a and the desired size and shape of a processingmeniscus. In addition, the IPA-vacuum-DIW orientation is configured so avacuum region substantially surrounds a DIW region and the IPA regionsubstantially surrounds at least the trailing edge region of the vacuumregion.

In another embodiment, the proximity heads 106 a and 106 b can bepositioned in close proximity to a top surface 108 a and a bottomsurface 108 b of the wafer 108 respectively by utilization of theproximity head carrier assembly 104. Once in this position, theproximity heads 106 a and 106 b may utilize the IPA and DIW sourceinlets and a vacuum source outlet(s) to generate wafer processingmeniscuses 116A and 116B in contact with the wafer 108 which are capableof applying and removing fluids from a top surface 108 a and a bottomsurface 108 b. The wafer processing meniscus may be generated inaccordance with the descriptions in reference to FIGS. 4 through 6Bwhere IPA vapor and DIW are inputted into the region between the wafer108 and the proximity heads 106 a and 106 b. At substantially the sametime the IPA and DIW is inputted, a vacuum may be applied in closeproximity to the wafer surface to output the IPA vapor, the DIW, and thefluids that may be on a wafer surface. It should be appreciated thatalthough IPA is utilized in the exemplary embodiment, any other suitabletype of vapor may be utilized such as any suitable alcohol vapor,organic compounds, hexanol, ethyl glycol, etc. that may be miscible withwater. These fluids may also be known as surface tension reducingfluids. The surface tension reducing fluids act to increase the surfacetension gradient between the two surfaces (i.e., the proximity head andthe surface of the wafer).

The portion of the DIW that is in the region between the proximity headand the wafer is the dynamic liquid meniscus. It should be appreciatedthat as used herein, the term “output” can refer to the removal of fluidfrom a region between the wafer 108 and a particular proximity head, andthe term “input” can be the introduction of fluid to the region betweenthe wafer 108 and the particular proximity head.

In another exemplary embodiment, the proximity heads 106 a and 106 b maybe moved in a manner so all parts of the wafer 108 are processed withoutthe wafer 108 being rotated. In such an embodiment, the proximity headcarrier assembly 104 may be configured to enable movement of the eitherone or both of the proximity heads 106 a and 106 b to close proximity ofany suitable region of the wafer 108. In one embodiment, of theproximity heads are smaller in length than a radius of the wafer, theproximity heads may be configured to move in a spiral manner from thecenter to the edge of the wafer 108 or vice versa. In an embodimentwhere the proximity heads are larger in length than a radius of thewafer, the proximity heads 106 a and 106 b may be moved over the entiresurface of the wafer in one rotation. In another embodiment, theproximity heads 106 a and 106 b may be configured to move in a linearfashion back and forth across the wafer 108 so all parts of the wafersurfaces 108 a and/or 108 b may be processed. Countless differentconfigurations of the system 100 may be utilized in order to obtain anoptimization of the wafer processing operation.

FIG. 3 shows a top view of a semiconductor wafer processing system 100-2with a proximity head 106 a-3 in a horizontal configuration that extendsacross a diameter of the wafer 108, in accordance with one embodiment ofthe present invention. In this embodiment, the proximity head 106 a-3 isheld by an upper arm 104 a-3 that extends across a diameter of the wafer108. The proximity head 106 a-3 may be moved into a processing positionby a vertical movement of the upper arm 104 a-3 so the proximity head106 a-3 can be in a position that is in close proximity to the wafer108. Once the proximity head 106 a-3 is in close proximity to the wafer108, the wafer processing operation of a top surface of the wafer 108can take place

FIG. 4 is an embodiment of an exemplary process that may be conducted bya proximity head 106 a, in accordance with one embodiment of the presentinvention. Although FIG. 4 shows a surface 108 a being processed, itshould be appreciated that the process may be accomplished insubstantially the same way for the bottom surface 108 b of the substrate108. While FIG. 4 illustrates a substrate drying process, many otherfabrication processes (e.g., etching, rinsing, cleaning, etc.) may alsobe applied to the substrate surface in a similar manner. In oneembodiment, a source inlet 302 may be utilized to apply isopropylalcohol (IPA) vapor toward a top surface 108 a of the substrate 108, anda source inlet 306 may be utilized to apply deionized water (DIW) towardthe top surface 108 a. In addition, a source outlet 304 may be utilizedto apply vacuum to a region in close proximity to the surface 108 a toremove fluid or vapor that may located on or near the top surface 108 a.

It should be appreciated that any suitable combination of source inletsand source outlets may be utilized as long as at least one combinationexists where at least one of the source inlet 302 is adjacent to atleast one of the source outlet 304 which is in turn adjacent to at leastone of the source inlet 306. The IPA may be in any suitable form suchas, for example, IPA vapor where IPA in vapor form is inputted throughuse of a N₂ carrier gas. Moreover, although DIW is utilized herein, anyother suitable fluid may be utilized that may enable or enhance thesubstrate processing such as, for example, water purified in other ways,cleaning fluids, and other processing fluids and chemistries. In oneembodiment, an IPA inflow 310 is provided through the source inlet 302,a vacuum 312 may be applied through the source outlet 304 and DIW inflow314 may be provided through the source inlet 306. Therefore, anembodiment of the IPA-vacuum-DIW orientation as described above inreference to FIG. 2 is utilized. Consequently, if a fluid film resideson the substrate 108, a first fluid pressure may be applied to thesubstrate surface by the IPA inflow 310, a second fluid pressure may beapplied to the substrate surface by the DIW inflow 314, and a thirdfluid pressure may be applied by the vacuum 312 to remove the DIW, IPAand the fluid film on the substrate surface.

Therefore, in one embodiment, as the DIW inflow 314 and the IPA inflow310 is applied toward a surface, any fluid on the surface is intermixedwith the DIW inflow 314. At this time, the DIW inflow 314 that isapplied toward the surface encounters the IPA inflow 310. The IPA formsan interface 118 (also known as an IPA/DIW interface 118) with the DIWinflow 314 and along with the vacuum 312 assists in the removal of theDIW inflow 314 along with any other fluid from the surface 108 a. In oneembodiment, the IPA/DIW interface 118 reduces the surface of tension ofthe DIW. In operation, the DIW is applied toward the surface 108 a andalmost immediately removed along with fluid on the substrate surface bythe vacuum applied by the source outlet 304. The DIW that is appliedtoward the surface 108 a and for a moment resides in the region betweena proximity head and the substrate surface along with any fluid on thesubstrate surface forms a dynamic liquid meniscus 116 where the bordersof the meniscus 116 are the IPA/DIW interfaces 118. Therefore, themeniscus 116 is a constant flow of fluid being applied toward thesurface 108 a and being removed at substantially the same time with anyadditional fluid that may previously be present on the surface 108 a.The nearly immediate removal of the DIW from the surface 108 a preventsthe formation of fluid droplets on the region of the surface that isbeing dried thereby reducing the possibility of contamination drying onthe surface 108 a. The pressure (which is caused by the flow rate of theIPA) of the downward injection of IPA can also help contain the meniscus116.

The flow rate of the N₂ carrier gas for the IPA assists in causing ashift or a push of fluid flow out of the region between the proximityhead and the surface 108 a and into the source outlets 304 through whichthe fluids may be output from the proximity head. Therefore, as the IPAand the DIW is pulled into the source outlets 304, the boundary makingup the IPA/DIW interface 118 is not a continuous boundary because gas(e.g., air) is being pulled into the source outlets 304 along with thefluids. In one embodiment, as the vacuum from the source outlet 304pulls the DIW, IPA, and the fluid on the surface 108 a, the flow intothe source outlet 304 is discontinuous. This flow discontinuity isanalogous to fluid and gas being pulled up through a straw when a vacuumis exerted on combination of fluid and gas. Consequently, as theproximity head 106 a moves, the dynamic liquid meniscus moves along withthe proximity head, and the region previously occupied by the dynamicliquid meniscus has been dried due to the movement of the IPA/DIWinterface 118. It should also be understood that the any suitable numberof source inlets 302, source outlets 304 and source inlets 306 may beutilized depending on the configuration of the apparatus and themeniscus size and shape desired. In another embodiment, the liquid flowrates and the vacuum flow rates are such that the total liquid flow intothe vacuum outlet is continuous, so no gas flows into the vacuum outlet.

It should be appreciated any suitable flow rate may be utilized for theIPA, DIW, and vacuum as long as the meniscus 116 can be maintained. Inone embodiment, the flow rate of the DIW through a set of the sourceinlets 306 is between about 25 ml per minute to about 3,000 ml perminute. In a preferable embodiment, the flow rate of the DIW through theset of the source inlets 306 is about 400 ml per minute. It should beunderstood that the flow rate of fluids may vary depending on the sizeof the proximity head. In one embodiment a larger head may have agreater rate of fluid flow than smaller proximity heads. This may occurbecause larger proximity heads, in one embodiment, have more sourceinlets 302 and 306 and source outlets 304 more flow for larger head.

In one embodiment, the flow rate of the IPA vapor through a set of thesource inlets 302 is between about 1 standard cubic feet per hour (SCFH)to about 100 SCFH. In a preferable embodiment, the IPA flow rate isbetween about 5 and 50 SCFH.

In one embodiment, the flow rate for the vacuum through a set of thesource outlets 304 is between about 10 standard cubic feet per hour(SCFH) to about 1250 SCFH. In a preferable embodiment, the flow rate fora vacuum though the set of the source outlets 304 is about 350 SCFH. Inan exemplary embodiment, a flow meter may be utilized to measure theflow rate of the IPA, DIW, and the vacuum.

FIG. 5 shows another process using another source inlet/outletorientation that may be conducted by a proximity head 106 a, inaccordance with one embodiment of the present invention. In thisembodiment, the proximity head 106 a may be moved over the top surface108 a of the substrate 108 so the dynamic liquid meniscus 116 may bemoved along the surface 108 a in direction 502. The dynamic liquidmeniscus applies fluid to the substrate surface and removes fluid fromthe substrate surface thereby processing (e.g., cleaning, etching,rinsing, etc.) and drying the surface 108 a simultaneously. In thisembodiment, the source inlet 306 applies a DIW flow 314 toward thesurface 108 a, the source inlet 302 applies IPA flow 310 toward thesurface 108 a, and the source outlet 312 removes fluid from the surface108 a.

It should be appreciated that in this embodiment, as well as otherembodiments of the proximity head 106 a described herein, additionalnumbers and types of source inlets and source outlets may be used inconjunction with the orientation of the source inlets 302 and 306 andthe source outlets 304 shown in FIG. 5. In addition, in this embodimentas well as other proximity head embodiments, by controlling the amountof flow of fluids onto the substrate surface 108 a and by controllingthe vacuum applied, the meniscus may be managed and controlled in anysuitable manner. For example, in one embodiment, by increasing the DIWflow 314 and/or decreasing the vacuum 312, the outflow through thesource outlet 304 may be nearly all DIW and the fluids being removedfrom the substrate surface 108 a. In another embodiment, by decreasingthe DIW flow 314 and/or increasing the vacuum 312, the outflow throughthe source outlet 304 may be substantially a combination of DIW and airas well as fluids being removed from the substrate surface 108 a.

FIG. 6A illustrates a proximity head 106 performing an exemplaryprocess, in accordance with one embodiment of the present invention. Theproximity head 106, in one embodiment, moves while in close proximity tothe top surface 108 a of the substrate 108 to conduct a cleaning and/ordrying operation. It should be appreciated that the proximity head 106may also be utilized to process (e.g., electroplate, etch, clean, dry,etc.) the bottom surface 108 b of the substrate 108. In one embodiment,the substrate 108 is rotating relative to the proximity head 106 so thatthe proximity head may be moved in a linear fashion along the headmotion while fluid is removed from the top surface 108 a. By applyingthe IPA 310 through the source inlet 302, the vacuum 312 through sourceoutlet 304, and the deionized water 314 through the source inlet 306,the meniscus 116 as discussed in reference to FIGS. 4 and 5 above may begenerated.

FIG. 6B shows a top view of a portion of a proximity head 106, inaccordance with one embodiment of the present invention. As shown fromleft to right are a set of the source inlet 302, a set of the sourceoutlet 304, a set of the source inlet 306, a set of the source outlet304, and a set of the source inlet 302. Therefore, as N₂/IPA and DIW areinput into the region between the proximity head 106 and the surface 108a, the vacuum removes the N₂/IPA and the DIW along with any fluid filmand other contaminants (e.g., particles, residues, etc.) that may resideon the surface 108 a. The source inlets 302, the source inlets 306, andthe source outlets 304 described herein may also be any suitable type ofgeometry such as for example, circular opening, square opening, etc. Inone embodiment, the source inlets 302 and 306 and the source outlets 304have circular openings.

FIG. 7 illustrates a side view of the proximity heads 106 a and 106 bfor use in a dual substrate surface processing system, in accordancewith one embodiment of the present invention. In this embodiment, byusage of source inlets 302 and 306 to input N₂/IPA and DIW (or otherprocessing fluids) respectively along with the source outlet 304 toprovide a vacuum, the dynamic liquid meniscus 116 may be generated. Inaddition, on the side of the source inlet 306 opposite that of thesource inlet 302, there may be a source outlet 304 to remove DIW and tokeep the meniscus 116 intact. As discussed above, in one embodiment, thesource inlets 302 and 306 may be utilized for N₂/IPA inflow 310 and DIWinflow 314 respectively while the source outlet 304 may be utilized toapply vacuum 312. It should be appreciated that any suitableconfiguration of source inlets 302, source outlets 304 and source inlets306 may be utilized. For example, the proximity heads 106 and 106 b mayhave a configuration of source inlets and source outlets like theconfiguration described above in reference to FIGS. 6A and 6B. Inaddition, in yet more embodiments, the proximity heads 106 a and 106 bmay be of a configuration as shown below in reference to FIGS. 8Athrough 10. Any suitable surface coming into contact with the meniscus116 may be processed and dried by the movement of the dynamic liquidmeniscus 116 into and away from the surface 108 a.

As shown in FIG. 7, the proximity head 106 processes the top surface 108a of the substrate 108, and the proximity head 106 b processes thebottom surface of 108 b of the substrate 108. By the inputting of theN₂/IPA and the DIW by the source inlets 302 and 306 respectively, and byuse of the vacuum from the source outlet 304, the meniscus 116 may beformed between the proximity head 106 and the substrate 108 and betweenthe proximity head 106 b and the substrate 108. The proximity heads 106and 106 b, and therefore the dynamic liquid meniscus 116, may be movedover the wet areas of the substrate surface in a manner so the entiresubstrate 108 can be processed (e.g., cleaned, dried).

FIG. 8A illustrates an exemplary proximity head 800, in accordance withone embodiment of the present invention. FIG. 8B illustrates a sectionalview of the proximity head 800, in accordance with one embodiment of thepresent invention. The proximity head 800 includes multiple processchemistry inlets 804, multiple IPA inlets 802, multiple IPA vapor inlets808 and multiple vacuum outlets 806. The various inlets 802, 804, 806and outlets 808 are arranged around a center portion 820. The centerportion 820 can be a sensor or an opening in the proximity head 800.

The sensor can be any type of sensor that may be useful within theproximity head 800. By way of example, an in-situ metrology sensor canmonitor an etch process to determine if the material desired to beetched away has been fully removed or partially removed according to thedesired result. The sensor can include one or more of the followingexemplary types of sensors: eddy current sensor (e.g., for measuringmetal and other compatible materials), scatterometry (e.g., for particleor topography measurements), optical interferometry or reflectometery(e.g., for measuring film thickness) and any other of the variousendpoint detection methods that are known to one skilled in the art.

FIG. 9A shows a top view of an exemplary annular meniscus 900 formed bythe proximity head 800, in accordance with one embodiment of the presentinvention. FIG. 9B shows a sectional view of the annular meniscus 900formed by the proximity head 800, in accordance with one embodiment ofthe present invention. The annular meniscus 900 includes a dry centralregion 902 where the liquid meniscus 900 is removed so that the centerportion 820 has no intervening processing chemistry from the meniscus900 between the central region 902 and the surface of the substrate 108.

By way of example, a sensor located in the center portion 820 can be afiber optic sensor that can be used for laser or broadband opticalinterferometry from the dry central region 902. In one embodiment, theproximity head 800 can apply an etch process to the surface 108 a. To beeffective and timely, an etch process requires a higher concentration ofetch chemistry than might typically be used in a multiple substratebatch process to be applied to the film to be removed from the surface108 a. A precise in-situ film measurement can be accomplished by theoptical interferometry in the dry central region 902 without theinterference typically caused by a thin liquid film or even by themeniscus 900. Rotating the substrate 108 and scanning the proximity head800, and therefore the sensor 820, across the surface 108 a can providean in-situ scan of the entire surface of the substrate, as the proximityhead processes the surface 108 a.

The sensor can also provide real time feedback of the etch process.Providing the real time feedback to a control system that controls theetch process will provide a closed control loop of the etch process. Theclosed loop control of the etch process can allow the control system tointeractively adjust the etch process in real time. Any of the multipleetch process variables can be adjusted including head position,concentrations, resident time, flow rates, pressures, chemistry andother process variables. In this manner more precise process control isprovided. A more precise process control allows ever more concentratedetch chemistries to be used, which in turn reduces the process time ofthe substrate to a minimum.

The in-situ, real time control of the process can also enable a variableprocess to be applied to the surface 108 a of the substrate 108 such asto correct for a non-uniformity during the processing of the surface 108a. By way of example, if in an etch process, the sensor can detect athinner film in a first region of the surface 108 a and a thicker filmin a second region. The etch process recipe can be dynamically adjusted(e.g., etch chemistry concentration, residence time, etc.) for thedetected film thickness as the proximity head 800 scans across thesurface 108 a. As a result, the non-uniform film thickness can bedynamically corrected in-situ as the etch process is applied to thesurface 108 a thereby substantially eliminating the need forreprocessing the surface 108 a to correct for non-uniformities.

Part 2: Substrate Dicing

FIG. 10A shows a side view of a substrate dicing system 1000, inaccordance with one embodiment of the present invention. FIG. 10B showsa top view of the substrate dicing system 1000, in accordance with oneembodiment of the present invention. The substrate dicing system 1000includes a proximity head 800 as described above in FIGS. 8A through 9B.The proximity head 800 can support either of an annular dynamic liquidmeniscus 900 (e.g., shown in FIGS. 9A through 10) or a dynamic liquidmeniscus that is not annular, e.g., does not include the central dryregion 902.

The substrate dicing system 1000 also includes a laser source 1002 thatcan emit a laser 1010. The center portion 820 of the proximity head 800can be a laser transparent “window” that is substantially transparent tothe beam of laser 1010. By way of example, the laser transparent windowcan be glass or quartz or any other material that is substantiallytransparent to the laser 1010. In one embodiment, if the window is a redglass but the red glass is substantially transparent to the wavelengthof light in the laser 1010. As used herein, the window is substantiallytransparent to the laser 1010 is the laser is not substantiallydiffracted or absorbed by the material or materials that form the windowin the center portion 820. The window can also be substantially thinnerthan the proximity head 800. By way of example, if the proximity head800 has a thickness T of about 20.0 mm, the window can have a thicknessof about 1.0 mm or less.

As the laser 1010 contacts the surface 108 a of the substrate 108, aportion of the substrate is cut away to form a groove or cut-awayportion 1030 into the surface 108 a. As the groove 1030 is formed, thelaser can produce particles.

The laser source 1002 can be a waterjet laser source that emits a laserthat is encased within a stream of water, such as described above in thebackground section. The center portion 820 of the proximity head 800 canbe an opening through the proximity head so that the water-jet laser1010 can pass through the proximity head to the surface of the substrate108 a.

Optionally, the laser source 1002 can be mechanically linked to theproximity head 800 such as by optional mechanical link 1020. Themechanical link 1020 maintains the alignment of the laser source 1002and the beam of laser 1010 with the center portion 820 of the proximityhead 800. Alternatively, the laser source 1002 can be controlled (e.g.,moved) independent of the proximity head 800 so as to align the lasersource 1002 and the beam of laser 1010 with the center portion 820.

In an embodiment where the laser source 1002 includes the water-jetlaser source (e.g., from Synova SA of Ecublens, Switzerland), theproximity head 800 can collect the water 1032 from the water jet andremove the water as part of the processing fluid that forms the meniscus900. As described above, the dynamic liquid meniscus 900 is formed bythe fluid(s) being supplied to the meniscus 900 and being drawn awayunder a vacuum. As the fluid is drawn away from the meniscus 900 under avacuum, the fluids can combine with the water 1032 from the water jetlaser and entrain and carry away any particles generated by the laser1010. Further, the dynamic liquid meniscus 900 provides a containment ofthe water 1032 and any particles generated by the laser 1010. In thismanner, the potential impact (e.g., particle contamination and fluidcontamination) to the surface 108 a of the substrate 108 issubstantially contained and limited.

Referring now to FIG. 10B, the proximity head 800 and the laser source1002. The substrate 108 includes multiple dies 1040 that are separatedby scribe channels 1050 a-1050 c. The proximity head 800, scribechannels 1050 a-1050 c and the dies 1040 are not drawn to typical scalesenvisioned. Typically, the scribe channels 1050 a-1050 c are minimizedso as to maximize the use of the substrate 108. The proximity head 800and the laser source 1002 can be moved along the scribe channels 1050 aand 1050 b so as to cut grooves into the scribe channels. By way ofexample, the proximity head 800 and the laser source 1002 can be movedin direction 1052 along scribe channel 1050 c and thereby cutting away aportion 1054 of the surface 108 a.

As described above, the dynamic liquid meniscus 900 can clean, rinse,etch and dry a surface of the substrate in a single pass. By way ofexample, as the proximity head 800 and the laser 1010 pass across thesurface 108 a of the substrate 108, the dynamic liquid meniscus 900 canrinse away any particles that were generated and dry the surface of thesubstrate. FIG. 11 is a flowchart of the method operations 1100 fordicing a substrate, in accordance with one embodiment of he presentinvention. In an operation 1105, the substrate 108 is placed within thesubstrate dicing system 1000 such as described above.

In an operation 1110, the proximity head 800 forms a dynamic liquidmeniscus 900 between the surface 108 a and the proximity head 800. Thedynamic liquid meniscus 900 can be formed using any desired fluidsand/or chemistry. By way of example, in one application, the particlesproduced in a dicing process may by more likely to adhere to the surface108 a and therefore a cleaning solution may be needed rather than wateror DIW. Alternatively, in a second application, a film of water or DIWmay be sufficient to carry away the particles produced by the dicingprocess.

In an operation 1115, the proximity head 800 aligns the central portion820 with a desired dicing location (e.g., an unused area 1050 c betweenthe dies 1040) on the substrate 108.

In an operation 1120, the substrate is diced. By way of example, thelaser source 1002 can emit the laser 1010 to begin dicing the substrate108 in the unused area 1050 c. Also in operation 1120, simultaneouslywith the laser source dicing the substrate 108, any particles and waterand other contaminants created in the dicing process are containedwithin the dynamic liquid meniscus 900. As the fluids within the dynamicliquid meniscus 900 flow out of the meniscus, the particles and waterand other contaminants created in the dicing process are carried awayfrom the surface 108 a of the substrate 108.

In an operation 1125, the proximity head 800 and laser 1010 moves alongthe unused area 1050 c to cut away a portion 1054 into the top surface108 a of the substrate 108. The depth D that the laser 1010 cuts intothe top surface 108 a of the substrate 108 is determined by a number offactors including a residence time, a material being cut and/or awavelength and a power of the laser 1010, to name but a few. By way ofexample, the time that the laser 1010 is focused on a particularlocation (i.e., the residence time) can determine the depth of thematerial removed from the substrate 108. The type of material beingremoved can also impact the depth the laser 1010 cuts into the substrate108. By way of example, if the top surface is a photoresist layer thatis particularly sensitive to light, then the laser 1010 may cut throughthe photoresist layer very quickly. However, if the top layer of thesubstrate 108 is a layer of silicon or silicon oxide, then the samelaser may not cut through the silicon or silicon oxide layer as quicklyas the photoresist layer. The power (i.e., intensity) and/or wavelengthof the laser 1010 can also be selected to determine a cutting rate(i.e., micron/second) that the laser will cut into the substrate 108.

As described above, the depth D that the laser 1010 cuts into thesubstrate 108 can be selected. In one embodiment, the depth D is lessthan a thickness T″ of the substrate 108 (i.e., the dicing operation isa partial dicing operation). Alternatively, the depth D is at leastequal to the thickness T″ of the substrate 108 (i.e., the dicingoperation is a full dicing operation).

As the proximity head 800 and laser 1010 moves across the surface 108 a,the meniscus 900 removes substantially all of the particles generated bythe laser, the fluids and moisture from the surface 108 a. As a result,the meniscus 900 dries the surface 108 a simultaneously with the laserdicing process thereby providing a dry-in dry-out substrate dicingprocess. The meniscus 900 can capture the any fluids (e.g., the waterjet). The captured fluids can be filtered to remove particles or othercontaminants and reused, thereby reducing a potentially costly wastestream.

FIG. 12 shows a full dicing system 1200, in accordance with oneembodiment of the present invention. As described above, in the fulldicing system 1200, the depth D that the laser 1010 cuts into thesubstrate 108 is equal to or greater than the thickness T″ of thesubstrate 108. The full dicing system 1200 includes a laser-absorbingtarget 1210 that is opposite to the proximity head 800. A secondproximity head 1202 can support the target 1210. The second proximityhead 1202 can also support a corresponding dynamic liquid meniscus 1204between the surface 108 b and the second proximity head 1202. Thesurface 108 b is opposite surface 108 a of the substrate 108 and thesecond proximity head 1202. As described above with regard to thedynamic liquid meniscus 900, the corresponding dynamic liquid meniscus1204 can entrain and carry away any particles formed or released on theopposite surface 108 b during the dicing process.

FIG. 13 is a flowchart of the method operations 1300 for the operationof the full dicing system 1200, in accordance with one embodiment of thepresent invention. In an operation 1305, the substrate 108 is placedwithin the substrate dicing system 1200 such as described above.

In an operation 1310, the first proximity head 800 forms a first dynamicliquid meniscus 900 between the surface 108 a and the proximity head800. In an operation 1315, the second proximity head 1202 forms a seconddynamic liquid meniscus 1204 between the surface 108 b and the secondproximity head 1202.

In an operation 1320, the first proximity head 800 aligns the centralportion 820 with a desired dicing location (e.g., an unused area 1050 cbetween the dies 1040) on the substrate 108. In an operation 1325, thesecond proximity head 1202 aligns with the first proximity head 800. Thesecond proximity head 1202 can also align the target 1210 with thedesired dicing location.

In an operation 1330, the substrate is diced. By way of example, thelaser source 1002 can emit the laser 1010 to begin dicing the substrate108 in the unused area 1050 c. Also in operation 1330, simultaneouslywith the laser source dicing the substrate 108, any particles and waterand other contaminants created in the dicing process are containedwithin the dynamic liquid meniscus 900. As the fluids within the dynamicliquid meniscus 900 flow out of the meniscus, the particles and waterand other contaminants created in the dicing process are carried awayfrom the surface 108 a of the substrate 108. As the laser 1010 cutsfully through the substrate 108, the second meniscus 1204 captures anyparticles 1232, water and other contaminants created in the dicingprocess are carried away from the second surface 108 b. Also inoperation, 1330 as the laser 1010 cuts fully through the substrate 108,the laser can be absorbed by the laser-absorbing target 1210.

In an operation 1335, the first proximity head 800 and laser 1010 movealong the unused area 1050 c to cut away a portion 1054 into the topsurface 108 a of the substrate 108. The second proximity head 1202 moveswith the first proximity head 800 so as to maintain alignment with thelocation that the laser 1010 is dicing the substrate 108.

FIG. 14 shows a block diagram of a substrate processing system 1400, inaccordance with one embodiment of the present invention. The systemincludes a controller 1402 that includes a recipe 1404. The recipe 1404controls the various parameters and aspects of the processes applied tothe substrate 108 by the proximity heads 800 and 1202. By way ofexample, the recipe determines flowrates of DIW, IPA and IPA vapor andpressures of the vacuum and the precise location of the proximity heads800 and 1202 and the direction of the proximity heads relative to thesubstrate 108. The substrate processing system 1400 also includes alaser source 1002 as described above in FIGS. 10A-13. The recipe 1404also controls the various aspects (e.g., a residence time, a materialbeing cut and/or a wavelength and a power) of the laser 1010 (not shown)that is emitted from the laser source 1002 as described above.

The substrate processing system 1400 can also include a sensor 1410 asdescribed above in reference to FIGS. 8A-9B. Sensor 1410 can monitor andevaluate the processes applied to the substrate 108 by the proximityheads 800 and 1202 and the laser 1010. By way of example, the sensor1410 can monitor the depth D that the laser 1010 cuts into the substrate108. In one embodiment, the sensor 1410 can provide feedback to thecontroller 1402. The controller 1402 can then modify the recipe inresponse to the feedback from the sensor 1410. The sensor 1410 can beincluded within the proximity head 800 such as described in FIGS. 8A-9Babove. Alternatively, the sensor 1410 can be external to the proximityheads 800 and 1202.

While the above invention has been described in terms of a dicing laser,the proximity head 800 can also be combined with other types of dicingmechanisms such as an abrasive saw or a scoring device to similarlycapture and transport any particles and contaminants created during thedicing process. In addition, the proximity head causes the resultingdies to be clean and dry after the dicing process.

While the above invention has been described in terms of a semiconductorsubstrate or a semiconductor substrate, it should be understood that thedescribed invention could be used to dice or score any type of substratewhich would be desirable to have a single pass, dry-in, dice,clean/rinse and dry-out process applied.

With the above embodiments in mind, it should be understood that theinvention may employ various computer-implemented operations involvingdata stored in computer systems. These operations are those requiringphysical manipulation of physical quantities. Usually, though notnecessarily, these quantities take the form of electrical or magneticsignals capable of being stored, transferred, combined, compared, andotherwise manipulated. Further, the manipulations performed are oftenreferred to in terms, such as producing, identifying, determining, orcomparing.

Any of the operations described herein that form part of the inventionare useful machine operations. The invention also relates to a device oran apparatus for performing these operations. The apparatus may bespecially constructed for the required purposes, or it may be ageneral-purpose computer selectively activated or configured by acomputer program stored in the computer. In particular, variousgeneral-purpose machines may be used with computer programs written inaccordance with the teachings herein, or it may be more convenient toconstruct a more specialized apparatus to perform the requiredoperations.

The invention can also be embodied as computer readable code on acomputer readable medium. The computer readable medium is any datastorage device that can store data which can thereafter be read by acomputer system. Examples of the computer readable medium include harddrives, network attached storage (NAS), read-only memory, random-accessmemory, CD-ROMs, CD-Rs, CD-RWs, magnetic tapes, and other optical andnon-optical data storage devices. The computer readable medium can alsobe distributed over a network coupled computer systems so that thecomputer readable code is stored and executed in a distributed fashion.

It will be further appreciated that the instructions represented by theoperations in the above figures are not required to be performed in theorder illustrated, and that all the processing represented by theoperations may not be necessary to practice the invention. Further, theprocesses described in any of the above figures can also be implementedin software stored in any one of or combinations of the RAM, the ROM, orthe hard disk drive.

Although the foregoing invention has been described in some detail forpurposes of clarity of understanding, it will be apparent that certainchanges and modifications may be practiced within the scope of theappended claims. Accordingly, the present embodiments are to beconsidered as illustrative and not restrictive, and the invention is notto be limited to the details given herein, but may be modified withinthe scope and equivalents of the appended claims.

1. A substrate processing system comprising: a first, movable surfacetension gradient device capable of supporting a first process within afirst meniscus, the first meniscus being supported between the firstsurface tension gradient device and a first surface of the substrate,the first movable surface tension gradient device capable of being movedrelative to the first surface of the substrate; a dicing device orientedto a desired dicing location, the desired dicing location beingencompassed by the meniscus; and a system controller being coupled tothe dicing device and the surface tension gradient device, the systemcontroller including a process recipe.
 2. The system of claim 1, whereinthe process includes at least one of a group of processes consisting ofa cleaning process, a rinsing process, an etch process, a depositionprocess, and an electroplating process.
 3. The system of claim 1,wherein supporting the process includes flowing a process fluid throughthe meniscus.
 4. The system of claim 1, wherein supporting the processincludes moving the meniscus relative to the first surface of thesubstrate.
 5. The system of claim 1, wherein moving the meniscusrelative to the first surface of the substrate includes drying the firstsurface.
 6. The system of claim 1, wherein the dicing device includes alaser.
 7. The system of claim 6, wherein the laser includes a water-jetlaser.
 8. The system of claim 1, wherein the surface tension gradientdevice includes a proximity head.
 9. The system of claim 1, wherein themeniscus includes a dry region substantially surrounding the desireddicing location.
 10. The system of claim 1, wherein the dicing devicecan be moved with the surface tension gradient device.
 11. The system ofclaim 1, wherein the dicing device can be moved independent from thesurface tension gradient device.
 12. The system of claim 1, furthercomprising a sensor capable of monitoring the desired dicing location.13. The system of claim 1, further comprising a dicing target supportedon a second surface of the substrate, the second surface being oppositethe first surface, the dicing target being supported in a positioncorresponding to the desired dicing location.
 14. The system of claim13, wherein the dicing device is a laser and the dicing target is alaser absorbing target.
 15. The system of claim 1, further comprising asecond, movable surface tension gradient device capable of supporting asecond process within a second meniscus, the second meniscus beingsupported between the second surface tension gradient device and asecond surface of the substrate, the second surface being opposite thefirst surface, the second movable surface tension gradient devicecapable of being moved relative to the second surface of the substrate.16. Method of dicing a substrate comprising: placing a substrate in asubstrate dicing system; forming a meniscus between a proximity head anda first surface of the substrate; dicing the substrate at a desireddicing location and simultaneously capturing any particles andcontaminants generated by dicing the substrate within the meniscus, themeniscus including the desired dicing location; and moving the meniscusin a desired dicing direction.
 17. The method of claim 16, whereinmoving the meniscus in the desired dicing direction includes drying thefirst surface of the substrate.
 18. The method of claim 16, whereindicing the substrate includes a partial dicing.
 19. The method of claim16, wherein dicing the substrate includes applying a laser to thedesired dicing location.
 20. The method of claim 19, wherein applyingthe laser includes applying the laser through the meniscus.
 21. Themethod of claim 19, wherein the meniscus is an annular meniscus andincludes a dry central region and wherein applying the laser includesapplying the laser through dry central region of the meniscus.
 22. Themethod of claim 16, wherein dicing the substrate includes a full dicing.23. The method of claim 22, further comprising forming a second meniscusbetween a second surface of the substrate, the second surface beingopposite from the first surface of the substrate.
 24. The method ofclaim 23, wherein dicing the substrate at the desired dicing locationincludes simultaneously capturing any particles and contaminantsgenerated by dicing the substrate within the second meniscus.
 25. Themethod of claim 23, wherein moving the first meniscus in the desireddicing direction includes moving the second meniscus.
 26. The method ofclaim 22, wherein dicing the substrate includes: applying a laser to thedesired dicing location; and absorbing the laser in a laser absorbingtarget near the second surface of the substrate.
 27. A substrateprocessing system comprising: a first proximity head capable ofsupporting a first process within a first meniscus, the first meniscusbeing supported between the first proximity head and a first surface ofthe substrate, the first proximity head capable of being moved relativeto the first surface of the substrate; a dicing laser source oriented todirect a laser to a desired dicing location, the desired dicing locationbeing encompassed by the first meniscus; a second proximity head capableof supporting a second process within a second meniscus, the secondmeniscus being supported between the second proximity head and a secondsurface of the substrate, the second surface being opposite the firstsurface, the second proximity head capable of being moved relative tothe second surface of the substrate; a laser absorbing target capable ofbeing supported in a position corresponding to the desired dicinglocation; and a system controller being coupled to the dicing lasersource and the first and second proximity heads, the system controllerincluding a process recipe.